<?xml version="1.0" encoding="utf-8" ?> <rss version="2.0" xmlns:opensearch="http://a9.com/-/spec/opensearch/1.1/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:atom="http://www.w3.org/2005/Atom"> <channel> <title> <![CDATA[SNU Library Search for 'su:&quot;VLSI Technology&quot;']]> </title> <link> https://library.snu.edu.in/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22VLSI%20Technology%22&#38;sort_by=&#38;format=rss </link> <atom:link rel="self" type="application/rss+xml" href="https://library.snu.edu.in/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22VLSI%20Technology%22&#38;sort_by=&#38;format=rss"/> <description> <![CDATA[ Search results for 'su:&quot;VLSI Technology&quot;' at SNU Library]]> </description> <opensearch:totalResults>80</opensearch:totalResults> <opensearch:startIndex>0</opensearch:startIndex> <opensearch:itemsPerPage>50</opensearch:itemsPerPage> <atom:link rel="search" type="application/opensearchdescription+xml" href="https://library.snu.edu.in/cgi-bin/koha/opac-search.pl?q=ccl=su%3A%22VLSI%20Technology%22&#38;sort_by=&#38;format=opensearchdescription"/> <opensearch:Query role="request" searchTerms="q%3Dccl%3Dsu%253A%2522VLSI%2520Technology%2522" startPage="" /> <item> <title> VLSI Technology: Introduction on VLSI Design </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26106</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26106">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26106</guid> </item> <item> <title> VLSI Technology: Bipolar Junction transistor </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26107</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26107">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26107</guid> </item> <item> <title> VLSI Technology: MOSFET Fabrication for IC </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26108</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26108">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26108</guid> </item> <item> <title> VLSI Technology: Crystal Structure of Si </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26109</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26109">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26109</guid> </item> <item> <title> VLSI Technology: Crystal Structure of Si </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26110</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26110">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26110</guid> </item> <item> <title> VLSI Technology: Defects in Crystal + Crystal Groath </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26111</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26111">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26111</guid> </item> <item> <title> VLSI Technology: Crystal Growth Cont., + Epitaxy I </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26112</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26112">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26112</guid> </item> <item> <title> VLSI Technology: Epitaxy II - Vapour Phase Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26113</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26113">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26113</guid> </item> <item> <title> VLSI Technology: Epitaxy III - Doping during Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26114</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26114">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26114</guid> </item> <item> <title> VLSI Technology: Molecular Beam Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26115</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26115">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26115</guid> </item> <item> <title> VLSI Technology: Oxidization I - Kinetics of Oxidation </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26116</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26116">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26116</guid> </item> <item> <title> VLSI Technology: Oxidization II - Oxidization rate Constants </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26117</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26117">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26117</guid> </item> <item> <title> VLSI Technology: Oxidization III - Dopant Redistribution </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26118</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26118">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26118</guid> </item> <item> <title> VLSI Technology: Oxidization IV - Oxide Charges </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26119</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26119">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26119</guid> </item> <item> <title> VLSI Technology: Diffusion I - Theory of Diffusion </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26120</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26120">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26120</guid> </item> <item> <title> VLSI Technology: Diffusion II - Infinite Source </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26121</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26121">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26121</guid> </item> <item> <title> VLSI Technology: Diffusion III - Actual Doping Profiles </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26122</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26122">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26122</guid> </item> <item> <title> VLSI Technology: Diffusion IV - Diffusion Systems </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26123</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26123">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26123</guid> </item> <item> <title> VLSI Technology: Ion - Implantation Process </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26124</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26124">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26124</guid> </item> <item> <title> VLSI Technology: Ion - Implantation Process </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26125</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26125">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26125</guid> </item> <item> <title> VLSI Technology: Annealing of Damages </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26126</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26126">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26126</guid> </item> <item> <title> VLSI Technology: Masking during Implantation </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26127</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26127">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26127</guid> </item> <item> <title> VLSI Technology: Lithography - I </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26128</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26128">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26128</guid> </item> <item> <title> VLSI Technology: Lithography - II </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26129</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26129">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26129</guid> </item> <item> <title> VLSI Technology: Wet Chemical Etching </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26130</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26130">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26130</guid> </item> <item> <title> VLSI Technology: Dry Etching </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26131</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26131">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26131</guid> </item> <item> <title> VLSI Technology: Plasma Etching System </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26132</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26132">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26132</guid> </item> <item> <title> VLSI Technology: Etching if Si, SiO2, SiN and other material </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26133</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26133">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26133</guid> </item> <item> <title> VLSI Technology: Plasma Dsposition Process </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26134</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26134">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26134</guid> </item> <item> <title> VLSI Technology: Metalization - I </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26135</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26135">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26135</guid> </item> <item> <title> VLSI Technology: IC BJT - From junction isolation to LOCOS </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26136</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26136">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26136</guid> </item> <item> <title> VLSI Technology: Problem in LOCOS + Trench isolation </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26137</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26137">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26137</guid> </item> <item> <title> VLSI Technology: More about BJT Fabrication and realization </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26138</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26138">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26138</guid> </item> <item> <title> VLSI Technology: Circuit + Transistor in ECL Circuit </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26139</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26139">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26139</guid> </item> <item> <title> VLSI Technology: MOSFET I - Metal gate Vs. Self Aligned Poly Gate </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26140</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26140">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26140</guid> </item> <item> <title> VLSI Technology: MOSFET II Talioring of devise Parameters </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26141</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26141">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26141</guid> </item> <item> <title> VLSI Technology: CMOS Technology </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26142</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26142">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26142</guid> </item> <item> <title> VLSI Technology: Latch up in CMOS </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26143</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26143">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26143</guid> </item> <item> <title> VLSI Technology: BICMOS Technology </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26144</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26144">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26144</guid> </item> <item> <title> VLSI Technology: BICMOS Technology </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26145</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=26145">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=26145</guid> </item> <item> <title> VLSI Technology: Introduction on VLSI Design </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30199</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30199">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30199</guid> </item> <item> <title> VLSI Technology: Bipolar Junction transistor </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30200</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30200">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30200</guid> </item> <item> <title> VLSI Technology: MOSFET Fabrication for IC </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30201</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30201">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30201</guid> </item> <item> <title> VLSI Technology: Crystal Structure of Si </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30202</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30202">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30202</guid> </item> <item> <title> VLSI Technology: Crystal Structure of Si </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30203</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30203">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30203</guid> </item> <item> <title> VLSI Technology: Defects in Crystal + Crystal Groath </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30204</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30204">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30204</guid> </item> <item> <title> VLSI Technology: Crystal Growth Cont., + Epitaxy I </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30205</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30205">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30205</guid> </item> <item> <title> VLSI Technology: Epitaxy II - Vapour Phase Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30206</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30206">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30206</guid> </item> <item> <title> VLSI Technology: Epitaxy III - Doping during Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30207</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30207">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30207</guid> </item> <item> <title> VLSI Technology: Molecular Beam Epitaxy </title> <dc:identifier>ISBN:</dc:identifier> <link>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30208</link> <description> <![CDATA[ <p> By Dasgupta, Nandita.<br /> Madras Indian Insitiute of Technology </p> ]]> <![CDATA[ <p> <a href="https://library.snu.edu.in/cgi-bin/koha/opac-reserve.pl?biblionumber=30208">Place hold on <em>VLSI Technology:</em></a> </p> ]]> </description> <guid>https://library.snu.edu.in/cgi-bin/koha/opac-detail.pl?biblionumber=30208</guid> </item> </channel> </rss>
