| 000 | 00861nam a22002057a 4500 | ||
|---|---|---|---|
| 003 | SNU | ||
| 005 | 20131226094825.0 | ||
| 008 | 130814b xxu||||| |||| 00| 0 eng d | ||
| 020 | _a9780815513711 | ||
| 028 |
_aAllied Publishers Pvt. Ltd. _b1/13-14, Asif Ali Road, New Delhi-110 _cDE/2013/CR/000558 _d30/07/2013 |
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| 082 | _a621.38152 FAR | ||
| 100 | _aFarrow, Robin F.C.(ed.by). | ||
| 245 |
_aMolecular beam epitaxy _b: applications to key materials _c/ edited by Robin F.C. Farrow |
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| 260 |
_aPark Ridge, N.J. _b: Noyes Publications, _c©1995.Wiley |
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| 300 |
_axx, 772 p. _b: ill. _c; 25 cm. |
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| 365 | _f13530 | ||
| 440 | _aMaterials science and process technology series. | ||
| 655 |
_bElectronics. _b, Molecular beam epitaxy. _b, Key materials. _b, Farrow, Robin F.C. _b, and Molecular beam epitaxy : applications to key materials. |
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| 942 |
_2ddc _cBOOK |
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| 999 |
_c9680 _d9680 |
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